Benjamin Tan1,Martha Serna1,Sivasakthya Mohan1,Yuqian Gu1,Kenneth Liechti1,Deji Akinwande1
The University of Texas at Austin1
Benjamin Tan1,Martha Serna1,Sivasakthya Mohan1,Yuqian Gu1,Kenneth Liechti1,Deji Akinwande1
The University of Texas at Austin1
The synthesis of homogeneous monolayer molybdenum disulfide (MoS<sub>2</sub>) thin films has been an important benchmark for enabling its usage in industrial scale electronic and optoelectronic devices. Recently, molecular O<sub>2</sub> has emerged as a reagent for scalable production of MoS<sub>2</sub> films through either gradual etching of an Mo source or evolution from MoO<sub>3</sub> preceding sulfurization. However, oxidation of MoS<sub>2</sub> and its precursors is not well understood and is a frequent subject of study. Here, we invert the order of traditional MoS<sub>2</sub> sulfurization to demonstrate that balancing the etch rate of partially formed MoS<sub>2</sub> films as opposed to an unreacted Mo source is an alternative pathway towards producing homogeneous monolayer MoS<sub>2</sub> films. Further, this growth enables adjacent regions of either multilayer or monolayer MoS<sub>2</sub> to be patterned dependent on whether the respective region was deposited with a Mo metal film or was left as exposed substrate. We study growth effects at 550 °C and 650 °C as well as different O<sub>2</sub> flow rates of 1 sccm and 5 sccm. This study suggests that MoS<sub>2</sub> formation through O<sub>2</sub> etching traverses two separate mechanisms based on the pristine quality of the partially formed MoS<sub>2</sub> source film. As suggested in theoretical studies, defect-filled MoS<sub>2</sub> lowers the activation energy of O<sub>2</sub> adsorption to 0.8 eV and leads to growth of monolayer-bilayer MoS<sub>2</sub> flakes. Alternatively, O<sub>2</sub> adsorption onto pristine MoS<sub>2</sub> raises the activation energy to 1.59 eV and generates monolayer MoS<sub>2</sub> films that spread homogeneously across a 1x5 cm area. The films were characterized as MoS<sub>2</sub> using Raman spectroscopy. XPS analysis also confirms peaks for MoS<sub>2</sub> that are shifted to higher energies due to the presence of trace MoO<sub>3</sub>. This demonstrates that the joint adsorption of oxygen and sulfur species onto Mo is advantageous to the creation of the observed homogeneous monolayer MoS<sub>2</sub>. Beyond this, Mo-O bonds present in the film could be a significant factor in increasing its photoluminescence compared to traditional MoS<sub>2</sub> syntheses.