MRS Meetings and Events

 

NM04.05.05 2023 MRS Spring Meeting

Multi-Printed MoS2 Semiconductor and Source and Drain Electrodes Using Jet-Printing for TFT Application

When and Where

Apr 12, 2023
5:00pm - 7:00pm

Moscone West, Level 1, Exhibit Hall

Presenter

Co-Author(s)

Woon-Seop Choi1,Thi Thu Thuy Can1

Hoseo University1

Abstract

Woon-Seop Choi1,Thi Thu Thuy Can1

Hoseo University1
Recently, transition-metal dichalcogenides (TMDs) have attracted much attention as new materials for electronics devices, electrocatalysts, photocatalysts, sensors, batteries, and bio-applications. Most TMDs are two-dimensional (2D) materials with a single layer. Bonds between each layer are made up of Van der Waals bonds, while intra-layer atoms bind together as covalent bonds.<br/>Chemical vapor deposition (CVD) with sulfur gas is the most popular method for synthesizing large- scale 2D materials with high quality. Various MoS<sub>2</sub> can be obtained from this method using various precursors with different properties, process temperatures, and substrate materials. Solution process methods show advantages for preparing films with large size, high throughput, low cost, thickness control, and an environmentally friendly process. Even though there is sulfur in the precursors of the solution-process synthesis methods, supplementing the sulfur that is lost in the high-temperature CVD process is unavoidable.<br/>Electrohydrodynamic (EHD) jet printing is a technique that uses electric fields to yield fluid flows for delivering solution/paste materials to a target substrate. EHD printing can create smooth areas or patterns with a large range of material viscosity, even with low-viscosity solutions or high-viscosity pastes, which are better by far than inkjet printing for this concern. Moreover, the merit of EHD jet printing is that MoS<sub>2</sub> TFTs can be patterned simply without using any shadow masks compared to other methods such as E-beam or thermal evaporation.<br/>Directly printed transistors have been in the limelight due to low cost and an environmentally friendly technique. An electrohydrodynamic (EHD) jet printing technique was employed to pattern both MoS<sub>2</sub> active layer and Ag source/drain electrodes. Printed MoS<sub>2</sub> lines were patterned on a silicon wafer using a precursor solution and simple annealing, and the patterns were transferred on other SiO<sub>2</sub> substrates for TFT fabrication. On top of the patterned MoS<sub>2</sub>, Ag paste was also patterned for source and drain electrodes using EHD jet printing. The printed TFTs had a high on-off current ratio exceeding 10<sup>5</sup>, low subthreshold slope, and better hysteresis behavior after transferring MoS<sub>2</sub> patterns. This result could be important for practical TFT applications and could be extended to other 2D materials.

Keywords

ink-jet printing

Symposium Organizers

Fatemeh Ahmadpoor, New Jersey Institute of Technology
Wenpei Gao, North Carolina State University
Mohammad Naraghi, Texas A&M University
Chenglin Wu, Missouri University of Science and Technology

Session Chairs

Congjie Wei
Chenglin Wu

In this Session

NM04.05.01
Nanofluidics: Transport In Chirality-Controlled Carbon Nanotube Porins (CNTPs)

NM04.05.02
Proximity Growth of Monolayer MoS2 Films via Concurrent O2 Etching and Sulfurization

NM04.05.04
Quasi-van der Waals Epitaxial Recrystallization of Gold Thin Film into Crystallographically Aligned Single Crystals

NM04.05.05
Multi-Printed MoS2 Semiconductor and Source and Drain Electrodes Using Jet-Printing for TFT Application

NM04.05.07
Realization of the Ideal vdW Contact Between Metals and Two-Dimensional Semiconductors Through Schottky Diode

NM04.05.08
Measuring Seebeck Coefficient of High Resistance 2D PtSe2 Thin Film by Annealing Process

NM04.05.10
Thermoelectric Properties of the Thickness-Modulated PtTe2 Thin Films

NM04.05.11
Crystal Structure Identification and Application of Type-II Red Phosphorus

NM04.05.12
Surface Modification of Molten Salt Etched Ti3C2Tz MXene by Annealing and their Tribological Evaluation

NM04.05.14
High Quality 2D α-MoO3 Microcrystals Produced by Laser Processing

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