MRS Meetings and Events

 

EL06.03.10 2024 MRS Spring Meeting

Tailoring Dielectric Permittivity in GdxCe1-xO2-δ Films by Ionic Defects

When and Where

Apr 23, 2024
5:00pm - 7:00pm

Flex Hall C, Level 2, Summit

Presenter

Co-Author(s)

Alessandro Palliotto1,Nini Pryds1,Daesung Park1

Danmarks Tekniske Universitet1

Abstract

Alessandro Palliotto1,Nini Pryds1,Daesung Park1

Danmarks Tekniske Universitet1
Fluorite-based crystalline materials have the general chemical formula AX<sub>2</sub> (A = Ca, Hf, Zn, Zr, Ce, while X = F, O) and find wide application in fuel cells, electroceramics, oxygen sensors and exhaust reduction systems. Despite their rather simple and prototypical crystallographic structure, “fluorites” remain the subject of much academic research and unexpected scientific discoveries [1], such as ferroelectricity in HfO<sub>2</sub>-based thin films or large electromechanical coupling in polycrystalline Gd-doped CeO<sub>2-<i>x</i></sub> (CGO) ceramics/films [2]. Moreover, a recent discovery has demonstrated the potential to induce significant piezoelectric effects in nominally centrosymmetric CGO by breaking symmetry through the control of ionic defects, specifically oxygen vacancies (V<sub>O</sub>) [2]. It was found that the motion and redistribution of defects induced by an electric field results in notable changes in the dielectric permittivity of the system, which are closely associated with the magnitude of the electromechanical effects [3]. Hence, controlling the dynamic V<sub>O</sub> in the CGO and similar oxides is key for achieving significant permittivity and electromechanical effects. In this work, we effectively tuned the V<sub>O</sub> contents in epitaxial CGO(001) films grown on Nb-doped SrTiO<sub>3</sub>(001) single crystal using pulsed laser deposition. Our findings show that the control of V<sub>O</sub> contents in the epitaxial films is highly limited, regardless of the oxygen environment (oxygen partial pressure, <i>P</i><sub>O</sub>), during high-temperature growth (e.g., <i>T</i> = 700 °C). In contrast, an effective control of V<sub>O</sub> contents in the epitaxial films was achieved by utilising a two-step growth technique. Subsequently, we noted a strong variation in the V<sub>O</sub> content in the engineered CGO films and the emergence of significant apparent dielectric permittivity, thus enabling the generation of substantial electromechanical coupling and piezoelectric effect.<br/><br/><b>Reference</b><br/>[1] U. Schroeder, et al., <i>Nat. Rev. Mater.</i>, <i>7</i>(8), 653–669 (2022).<br/>[2] D.-S. Park, et al., <i>Science</i>, <i>375</i>, 653–657 (2022).<br/>[3] D. Damjanovic, <i>Rep. Prog. Phys.</i>, <i>61</i>(9), 1267–1324 (1998).

Keywords

dielectric properties | physical vapor deposition (PVD)

Symposium Organizers

Aiping Chen, Los Alamos National Laboratory
Woo Seok Choi, Sungkyunkwan University
Marta Gibert, Technische Universität Wien
Megan Holtz, Colorado School of Mines

Symposium Support

Silver
Korea Vacuum Tech, Ltd.

Bronze
Center for Integrated Nanotechnologies, Los Alamos National Laboratory
Radiant Technologies, Inc.

Publishing Alliance

MRS publishes with Springer Nature