MRS Meetings and Events

 

NM01.17.04 2022 MRS Spring Meeting

HfZrO2-Based Negative Capacitance Field-Effect Transistor with Molybdenum Disulfide Transition Metal Dichalcogenides and Al2O3 Dielectrics

When and Where

May 11, 2022
5:00pm - 7:00pm

Hawai'i Convention Center, Level 1, Kamehameha Exhibit Hall 2 & 3

Presenter

Co-Author(s)

Moonyoung Jung1,Dongseok Suh1,2

Sungkyunkwan university1,Institute for Basic Science2

Abstract

Moonyoung Jung1,Dongseok Suh1,2

Sungkyunkwan university1,Institute for Basic Science2
Subthreshold swing (SS) of conventional metal-oxide-semiconductor field-effect transistors (MOSFETs) have been limited to the 60 mV/dec by the fundamental thermionic limitation, so called Boltzmann tyranny. To overcome the limitation, The negative capacitance (NC) field effect transistor using thin film of doped HfO<sub>2</sub>-based ferroelectrics has been attracting attentions due to the compatibility of CMOS process, maintaining ferroelectricity under 10 nm thickness, high retention and endurance.<sup>[1-3]</sup> In addition, Molybdenum disulfide (MoS<sub>2</sub>) of transition metal dichalcogenides has been extensively studied for low-power and high performance transistors as channel layer due to high carrier mobility, thickness dependence of band structure and no surface roughness.<sup>[4-6]</sup><br/>Here, we fabricated a ferroelectric field effect transistor (Fe-FET) using a HfZrO<sub>2</sub> ferroelectric as a gate dielectric and a CVD-grown monolayer MoS<sub>2</sub> as a channel layer. It was directly observed that the drain current changed rapidly in the region where the polarization is switched from I<sub>g</sub>-V<sub>g</sub>, and the I<sub>on</sub>/I<sub>off</sub> ratio and the subthreshold swing were observed to change according to the amount of polarization switching. In addition, we fabricated the negative capacitance field effect transistor using the series of HfZrO<sub>2</sub> and Al<sub>2</sub>O<sub>3</sub> as a gate dielectric. It showed over 10<sup>7</sup> I<sub>on</sub>/I<sub>off</sub> ratio and less than 60 mV/dec subthreshold swing without hysteresis behavior at the low voltage driving (1 V<sub>g</sub>).<br/><b>Reference</b><br/>1. Min Hyuk Park et al. MRS communications. 8, 3, (2018)<br/>2. Sayeef Salahuddin and Supriyo Datta. Nano Lett. 8, 2, 405-410 (2008)<br/>3. Mengwei Si, et al. Nature Nanotechnology 13, 24-28 (2018)<br/>4. Radisavljevic, B et al, Nature Nanotech. 6, 147-150 (2011)<br/>5. Mak, K et al. Phys. Rev. Lett. 105, 136805 (2010)<br/>6. Li, S.-L et al. Nano Lett. 13 (8), 3546-3552 (2013)<br/><b>Acknowledgments</b><br/>This research was supported by the Industrial Strategic Technology Development Program (20006492) funded by the Ministry of Trade, Industry and Energy (MOTIE, Korea).

Keywords

2D materials | thin film

Symposium Organizers

Zakaria Al Balushi, University of California, Berkeley
Olga Kazakova, National Physical Laboratory
Su Ying Quek, National University of Singapore
Hyeon Jin Shin, Samsung Advanced Institute of Technology

Symposium Support

Bronze
Applied Physics Reviews | AIP Publishing
ATTOLIGHT AG
Penn State 2DCC-MIP

Session Chairs

Zakaria Al Balushi

In this Session

NM01.17.03
Wide Range Continuously Tunable and Fast Thermal Switching Based on Compressible Graphene Composite Foams

NM01.17.04
HfZrO2-Based Negative Capacitance Field-Effect Transistor with Molybdenum Disulfide Transition Metal Dichalcogenides and Al2O3 Dielectrics

NM01.17.06
Buried Graphene-Based Triple Gates for Steep Slope TFETs

NM01.17.08
Long-Term Multilevel Memory and Synaptic Function Transistors Using 2D MoSe2/MoS2 Heterostack Channel

NM01.17.09
Contact Resistance Reduction in 2D MoS2 FETs Through the Thermal-Evaporated LiF Interlayer

NM01.17.11
Change in the Phonon Frequency Spectra of Xenes due to an Isotopic Impurity

NM01.17.13
Surface Alloy as a New Substrate for Transition Metal Dichalcogenide Growth by Chemical Vapor Deposition

NM01.17.14
The Synthesis and Characterization of Homogeneous High-Quality Graphene Encapsulated Metallic Powders via Plasma Enhanced Rotating CVD

NM01.17.16
Predicting the Electronic and Thermal Properties of Transitional Metal Dichalogenide Heterostructure

NM01.17.17
Mesoscale Operando Investigation of Electrochemically Controlled Anion Intercalation in 2D van der Waals Heterostructure

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