Rong Wu1,2,Florian Maudet1,Thanh Luan Phan1,Sebastian Schmitt1,Veeresh Deshpande1,Catherine Dubourdieu1,2
Helmholtz-Zentrum Berlin1,Freie Universität Berlin2
Rong Wu1,2,Florian Maudet1,Thanh Luan Phan1,Sebastian Schmitt1,Veeresh Deshpande1,Catherine Dubourdieu1,2
Helmholtz-Zentrum Berlin1,Freie Universität Berlin2
Rare-earth hexagonal manganites, h-<i>R</i>MnO<sub>3</sub> (<i>R</i>=Y, Er, Ho to Lu) have been widely studied for their multiferroic properties. Polycrystalline hexagonal YMnO<sub>3</sub> thin films with promising resistive switching performance were reported recently [1], which gained interest for neuromorphic applications owing to the peculiar ferroelectric domain pattern and vortex lines in hexagonal <i>R</i>MnO<sub>3</sub> [2].<br/>In this work, we report the demonstration of bipolar resistive switching behavior in polycrystalline ErMnO<sub>3</sub>-based capacitors. The ErMnO<sub>3</sub> films (~ 60 nm) were prepared by room temperature RF sputtering on Pt/Ti/SiO<sub>2</sub>/Si substrates, followed by post-deposition annealing. The Al/Ti top electrodes were patterned by photolithography. The post-deposition annealing resulted in the formation of polycrystalline ErMnO<sub>3</sub> thin films with orthorhombic and hexagonal phases as shown by X-ray diffraction. We investigated the influence of these different crystalline phases on the switching performance and, for this purpose, developed a way to quantify the relative amount of both phases by scanning electron microscopy, Raman spectroscopy and conductive atomic force microscopy. Through a detailed structural evaluation combined with electrical characterization we developed an understanding of the physical origin of resistive switching in polycrystalline ErMnO<sub>3</sub> and the role of the different phases. The Au/Ti/ErMnO<sub>3</sub>/Pt devices exhibit a bipolar resistive switching with a R<sub>OFF</sub>/R<sub>ON</sub> ratio larger than 10<sup>4</sup> and an ultra-low resistance of only 10 Ω in the low resistance state, which can be of interest for CMOS circuitry with low power consumption [3] and for RF power switches [4]. We attribute the switching performance to the formation and rupture of conductive oxygen vacancy-based filaments. We find that a higher fraction of orthorhombic phase reduces the operation voltage but leads to a decrease of the memory window, which can be ascribed to higher Mn<sup>4+</sup> concentration and more oxygen vacancies in the orthorhombic phase. These findings emphasize the potential of polycrystalline ErMnO<sub>3</sub> films as promising candidates for neuromorphic applications and provide valuable insights for enhancing the device performances by engineering the ErMnO<sub>3</sub> switching layer.<br/><br/><br/><br/><b>References</b><br/>[1] V. R. Rayapati <i>et al.</i>, J. Appl. Phys. 126 (2019), doi:10.1063/1.5094748.<br/>[2] H. Schmidt, Appl. Phys. Lett. 118, 140502 (2021), doi: 10.1063/5.0032988.<br/>[3] H. Cao, <i>et al.</i>, Appl. Phys. Lett. 120, 133502 (2022), doi: 10.1063/5.0085045.<br/>[4] N. Wainstein, <i>et al.</i>, Proc. IEEE. 109, 77–95 (2021), doi:10.1109/JPROC.2020.3011953.