Masashi Koyanagi1,Takeshi Torita1
Murata Manufacturing Co., Ltd.1
Masashi Koyanagi1,Takeshi Torita1
Murata Manufacturing Co., Ltd.1
MXene is expected to be used in a wide range of material applications because of its diverse material properties derived from its various compositions and surface groups. Single layer MXene is necessary to obtain material quality that meets the demanding of these MXene applications. However, the problem is that the high-quality single layer MXene reported so far has chlorine groups on the surface. In general, materials containing chlorine cause corrosion and other failures in electrical components. Furthermore, halogen-free materials are required due to the increasing importance of halogen regulations as a result of the recent rise in environmental awareness. However, it is known that to obtain single layered MXene without chlorine groups requires TMAOH(tetramethylammonium hydroxide), which is difficult to remove, or exfoliation processes such as ultrasonication, which involves reducing the particle size, resulting in a significant decrease in conductivity [1].<br/>In this study, we have succeeded in obtaining highly conductive halogen-free MXene by our original synthesis method. In addition, halogen-free MXene is less susceptible to moisture absorption than MXene with chlorine groups, and thus achieves high material reliability.<br/><b>References</b><br/>[1] Mohamed Alhabeb, Kathleen Maleski, Babak Anasori, Pavel Lelyukh, Leah Clark, Saleesha Sin and Yury Gogotsi, <i>Chem. Mater.</i> <b>2017</b>, <i>29</i>, 7633−7644.