MRS Meetings and Events

 

EQ02.13.03 2022 MRS Fall Meeting

Metasurface Enabled Polarization Sensitive Detection-Aspect Ratio and Design Tolerance for Nanofabrication for the Dielectric Metasurface Element

When and Where

Dec 7, 2022
8:45am - 9:00am

EQ02-virtual

Presenter

Co-Author(s)

Hosna Sultana1

University of Alabama1

Abstract

Hosna Sultana1

University of Alabama1
Using the benefit of flat optics metasurface, polarization-sensitive imaging technology has been developing in recent years with a reasonable promise to utilize it as a sensing method. Instead of imaging with light intensity, polarization-sensitive detection can take advantage of the orientation of the electric field to reveal the edge, hidden features, and many details of a target. Metasurface can serve as a stokes intensity splitter based on the incidence polarization state of light, and this utility has become a benchmark of optical sensing. This work explores high contrast dielectric metasurface design with Finite Difference Time Domain (FDTD) simulation to optimize dielectric material choice, layer combination, geometric shape, and assembly to make a total phase, transmission, and polarization control metasurface for 532 nm working wavelength. However, suitable material and design for the total phase control for this wavelength already exist, but the crucial limit of perfect nanofabrication, the design margin, needed to be relaxed. So the main focus of this research is on reducing the height of the nanoantenna and exploring the useful geometric features that can influence the mutual interaction of the metasurface element. For shape optimization, our metasurface element will go beyond the axially rotational symmetric component to affect the orthogonal phase differently. This will continue implementing anisotropic metasurface elements, which may improve the efficiency of detecting scattered light beams as expected from the diverse scattering medium.

Keywords

dielectric properties | nanostructure

Symposium Organizers

Viktoriia Babicheva, University of New Mexico
Antonio Ambrosio, Fondazione Istituto Italiano di Tecnologia
Cheng-Wei Qiu, National University of Singapore
Giulia Tagliabue, École Polytechnique Fédérale de Lausanne

Publishing Alliance

MRS publishes with Springer Nature