David Storm1,Sergey Maximenko1,Andrew Lang1,Neeraj Nepal1,Tatyana Feygelson1,Bradford Pate1,David Meyer1
US Naval Research Laboratory1
David Storm1,Sergey Maximenko1,Andrew Lang1,Neeraj Nepal1,Tatyana Feygelson1,Bradford Pate1,David Meyer1
US Naval Research Laboratory1
Cubic boron nitride has several electronic and thermal properties which make it an attractive candidate for high power and high temperature electronic applications: an ultra-wide band gap (6.4 eV, indirect); a high thermal conductivity, second only to diamond; and its capacity to be doped both <i>n</i>- and <i>p</i>-type. Further, its structural and electronic similarity to diamond hold the potential for novel electronic devices based on c-BN/diamond heterostructures. However, there are numerous challenges associated with growing device-quality layers of c-BN, including the existence of multiple phases of BN; the metastability of the cubic phase at pressures and temperatures typical of vapor-phase growth; and the absence of large-area bulk c-BN crystals, which necessitates heteroepitaxial growth on non-native substrates.<br/><br/>Single crystal epitaxial cubic boron nitride films were grown on (100) oriented IIa diamond substrates by ion beam-assisted molecular-beam epitaxy (MBE) in a custom MBE system equipped with an Ar ion source, a N<sub>2</sub> plasma source, and an electron beam evaporator for supplying elemental boron. Fourier transform infrared spectroscopy indicates these films are fully cubic, and the phase identification is corroborated by x-ray photoelectron spectroscopy. Transmission electron microscopy confirms the presence of an epitaxial c-BN film with isolated misfit dislocations and no indication of h-BN. The interface between the c-BN layer and the diamond substrate is structurally abrupt, and no interlayer between the c-BN film and diamond substrate is seen. It was found that trace amounts of impurities, such as Mg, facilitate the growth of c-BN on diamond by ion-assisted MBE. [1]<br/><br/>[1] D.F. Storm et al., phys status solidi-RRL https://doi.org/10.1002/pssr.202200036 (2022).