MRS Meetings and Events

 

EQ10.08.01 2022 MRS Fall Meeting

Improving Crystallization Temperature by Ge-Incorporation in GexSbyTez Phase Change Alloys and Heterostructures for Automotive Applications

When and Where

Nov 30, 2022
8:30am - 9:00am

Hynes, Level 1, Room 108

Presenter

Co-Author(s)

Raffaella Calarco1,Adriano Diaz Fattorini1,Marco Bertelli1,Sara De Simone1,Valentina Mussi1,Francesco De Nicola1,Massimo Longo1,Giuseppe D'Arrigo1,Inaki Garcia Lopez1,Antonella Sciuto1,Stefania Privitera1,Massimo Borghi2,Andrea Redaelli2,Marie-Claire Cyrille3,Nguyet-Phuong Tran3

Consiglio Nazionale delle Ricerce1,STMicroelectronics2,LETI3

Abstract

Raffaella Calarco1,Adriano Diaz Fattorini1,Marco Bertelli1,Sara De Simone1,Valentina Mussi1,Francesco De Nicola1,Massimo Longo1,Giuseppe D'Arrigo1,Inaki Garcia Lopez1,Antonella Sciuto1,Stefania Privitera1,Massimo Borghi2,Andrea Redaelli2,Marie-Claire Cyrille3,Nguyet-Phuong Tran3

Consiglio Nazionale delle Ricerce1,STMicroelectronics2,LETI3
The interest in Phase Change Memory (PCM) devices with improved crystallization temperature is increasing for automotive applications, where devices must be able to operate reliably at high temperatures (&gt; 160 °C) for at least ten years. Alloys like Ge<sub>2</sub>Sb<sub>2</sub>Te<sub>5</sub> (GST225) are already a standard to realize memory devices. However, one of the major disadvantages of GST225 single layers is the low crystallization temperature (T<sub>c</sub>), which results in low thermal stability and limited data retention. An interesting option to increase T<sub>c</sub> is to grow Ge-rich GST alloys. Here, several Ge<sub>x</sub>Sb<sub>2</sub>Te<sub>5</sub> and Ge<sub>x</sub>Sb<sub>2</sub>Te<sub>3</sub> layers were grown by RF-sputtering and their thermal stability was studied by X-ray diffraction (XRD) and Raman spectroscopy as a function of temperature. The compositional analysis was performed by X-ray fluorescence (XRF). The results showed that both T<sub>c </sub>and Ge-segregation amount grow linearly with the Ge-content in the alloys. Among the different possibilities, our approach combines different phase change materials with opposite properties (Sb<sub>2</sub>Te<sub>3</sub>, Ge<sub>2</sub>Sb<sub>2</sub>Te<sub>5</sub> and Ge<sub>x</sub>Sb<sub>y</sub>Te<sub>z</sub>)<b>, </b>also introducing a confinement Ge layer to realize interesting novel test devices. Therefore Sb<sub>2</sub>Te<sub>3</sub>/Ge<sub>2</sub>Sb<sub>2</sub>Te<sub>5</sub>/Ge heterostructures with a total thickness of 110 nm were deposited by RF sputtering and their thermal stability was analyzed by X-ray diffraction and Raman spectra, evidencing a slower crystallization dynamic (by 50°C) than in Ge<sub>2</sub>Sb<sub>2</sub>Te<sub>5</sub>. After optimization, the heterostructures were deposited onto proper single-cell vehicles prepared on Si(001) substrates and metal contacts were nanolithographically (EBL) defined. The subsequent technical analysis (I-V, R-V, R-cycles graphs for the SET/RESET states) showed that the cell has a programming current of 1.2 mA and an endurance of 2x10<sup>5</sup> cycles.<br/>This project has received funding from the European Union's Horizon 2020 research and innovation program under Grant Agreement No. 824957 (“BeforeHand:” Boosting Performance of Phase Change Devices by Hetero and Nanostructure Material Design).

Keywords

sputtering | thin film | x-ray diffraction (XRD)

Symposium Organizers

Wei Zhang, Xi'an Jiaotong University
Valeria Bragaglia, IBM Research Europe - Zurich
Juejun Hu, Massachusetts Institute of Technology
Andriy Lotnyk, Leibniz Institute of Surface Engineering

Publishing Alliance

MRS publishes with Springer Nature