The Effect of Carbon Compounds on MXene Surfaces

MXene can be used in a wide range of material applications because of its diverse material properties, derived from its various compositions and surface termination groups. Surface terminations, such as –F, –O, –OH, are introduced by the etching process, and many works related to surface terminations have already been published. One publication has already explored how surface terminations affect the resulting material properties, as well as how to control surface termination groups.^[1]<br/>However, in reality, MXene also captures carbon compounds spontaneously by electrostatic interaction. Therefore, we should also take these factors into account. XPS is a useful method for evaluating surface properties. Generally, we use Ar sputtering to remove contaminants on the sample surface, but sputtering also affects the inherent surface condition. In such case, gas cluster ion beam (GCIB) provides an alternative way to clean the sample surface, while causing less damage.^[2] Accordingly, herein we present on GCIB treatment of MXene samples, and outline property differences before and after carbon compounds are removed from the MXene surface.<br/><br/><b>References</b><br/>^[1] James L. Hart, Kanit Hantanasirisakul, Andrew C. Lang, Babak Anasori, David Pinto, Yevheniy Pivak, J. Tijn van Omme, Steven J. May, Yury Gogotsi & Mitra L. Taheri, Nature Communications vol. 10, 2019, 522<br/>^[2] Isao Yamada, Jiro Matsuo, Noriaki Toyoda, Allen Kirkpatrick, Materials science and Engineering, R 34, 2001, 231-295