Fast Open-Air Deposition of Nanomertic Components for (Opto)Electronic Devices Through Spatial Atomic Layer Deposition

Spatial Atomic Layer Deposition (SALD) is a recent variant of ALD that offers fast processing, even at atmospheric pressure, while preserving the unique assets of ALD, namely, precise thickness control down to the nanometer, high-quality films even at low temperatures, and unique conformality. As a result, SALD is ideal for applications requiring high throughput at low cost, such as new generation photovoltaics, LEDs or packaging. In particular, the SALD approach based on close-proximity deposition heads is highly versatile since it can be easily customized by proper design of the deposition heads and because the deposition takes place in the open air without the need of any deposition chamber.<br/>In my talk, I will briefly introduce the SALD technique and present the developments we are currently carrying out at LMGP. I will then present several examples of how SALD can be used to enhance the performance of different (opto)electronic devices thanks to the deposition of nanometric films.