MRS Meetings and Events

 

DS02.04.03 2022 MRS Spring Meeting

Predicting Char Yield of High-Temperature Resins

When and Where

May 11, 2022
10:00am - 10:15am

Hawai'i Convention Center, Level 3, 313C

Presenter

Co-Author(s)

Jacob Gissinger1,Kristopher Wise1

NASA Langley Research Center1

Abstract

Jacob Gissinger1,Kristopher Wise1

NASA Langley Research Center1
A simulation protocol was developed to predict the char yield of organic resins during high-temperature processing. Such <i>in silico </i>methods can help screen promising new formulations for advanced materials, but previously no chemistry-sensitive technique existed to predict the important experimental value of char yield. The method utilizes a reactive force field (ReaxFF) to model the chemical transformation of precursor monomers into carbonized structures during three processing stages: ramp-up to simulated annealing temperatures (~3000 K), pyrolysis, and quenching. Achieving good agreement with experimental char yields requires continuous removal of small byproduct molecules to mimic outgassing, and the application of high pressure to eliminate porosity and encourage graphitization. More than ten different resin chemistries were investigated, including arylacetylenes, cyanate esters, phthalonitriles, and polyimides, representing a diverse group of precursors with respect to initial cyclic content, heteroatoms and reactive groups. The protocol correctly predicts the relative char yield between the investigated chemistries and provides quantitative agreement with experimental values, especially for high char yield resins. The properties of the resins during processing were compared, including outgassing products, morphology of the final chemical configurations, cyclic content, and mechanical properties.

Keywords

nanostructure

Symposium Organizers

Veruska Malavé, National Institute of Standards and Technology
Vitor Coluci, UNICAMP
Kun Fu, University of Delaware
Hui Ying Yang, SUTD

Symposium Support

Silver
National Institute of Standards and Technology (NIST)

Publishing Alliance

MRS publishes with Springer Nature