John Lasseter1,Steven Randolph2,Philip Rack1
University of Tennessee1,Oak Ridge National Laboratory2
John Lasseter1,Steven Randolph2,Philip Rack1
University of Tennessee1,Oak Ridge National Laboratory2
We showcase selected area chemical vapor deposition (CVD) on 3D nanostructures by taking advantage of photothermal heat transport, which is intrinsic to the nanostructure and not limited to a specific substrate. Nanostructure templates are deposited through lithographic, direct write and other nanofabrication methods and results indicate the ability to initiate the process below the diffraction limit. Focused Electron Beam Induced Deposition (FEBID) is featured as a high-resolution nanofabrication method with short iteration times. The nanostructures are then irradiated under a focused, unpolarized laser with gas precursor flow and no electron beam to induce photothermal CVD. PtC<sub>x</sub> FEBID deposits were systematically investigated to show the effects of laser pulse width, power, and repetition rate on growth rates. Finite element thermal simulations were performed and corroborate experiment - evidence points towards a deposition process dominated by the nanostructure thermal conductivity and geometry, but substrate thermal conductivity and the nanostructure optical absorbance still have some effect. Efforts to create functional nanostructures by utilizing magnetic (Co<sub>2</sub>(CO)<sub>8</sub>), plasmonic (dimethylgold(III) acetylacetonate) and O<sub>2</sub>/H<sub>2</sub>O gas coflows for material purification are presented, as well as the ability to modify FEBID deposits in parallel.