Plasma Etch in the Nanosheet FET Era and Beyond

Plasma etch is a critical technology for the fabrication of integrated circuits. As the transistor architecture has evolved from planar FET to finFET to nanosheet FET to complimentary FET, plasma etch has also continually evolved to meet the ever-tightening process specifications. In this talk, we will review the seminal innovations in plasma etch that will enable these technology inflections. The focus of this talk will be on pulsed plasma, atomic layer etch, and cryogenic etch that offer a pathway to escape the fundamental limits of thermodynamics and mass transfer during the plasma etch.