Apr 22, 2024
5:00pm - 5:15pm
Room 347, Level 3, Summit
Dane DeQuilettes1,2,Jason Yoo1,Roberto Brenes1,Felix Kosasih3,Madeleine Laitz1,Benjia Dou1,Daniel Graham4,Kevin Ho4,Yangwei Shi4,Seong Sik Shin5,6,Caterina Ducati3,Moungi Bawendi1,Vladimir Bulovic1
Massachusetts Institute of Technology1,Optigon Inc.2,University of Cambridge3,University of Washington4,Korea Institute of Science and Technology5,Sungkyunkwan University6
Dane DeQuilettes1,2,Jason Yoo1,Roberto Brenes1,Felix Kosasih3,Madeleine Laitz1,Benjia Dou1,Daniel Graham4,Kevin Ho4,Yangwei Shi4,Seong Sik Shin5,6,Caterina Ducati3,Moungi Bawendi1,Vladimir Bulovic1
Massachusetts Institute of Technology1,Optigon Inc.2,University of Cambridge3,University of Washington4,Korea Institute of Science and Technology5,Sungkyunkwan University6
The ability to reduce energy loss at semiconductor surfaces through passivation or surface field engineering has become an essential step in the manufacturing of efficient photovoltaic (PV) and optoelectronic devices.<sup>1</sup> Similarly, surface modification of emerging halide perovskites with quasi-2D heterostructures is now ubiquitous to achieve PV power conversion efficiencies (PCEs) > 22% and has enabled single-junction PV devices to reach >26%, yet a fundamental understanding to how these treatments function is still generally lacking. This has established a bottleneck for maximizing beneficial improvements as no concrete selection and design rules currently exist. Here we uncover a new type of tunable passivation strategy and mechanism found in perovskite PV devices that were the first to reach the > 25% PCE milestone, which is enabled by surface treating a bulk perovskite layer with hexylammonium bromide (HABr). We uncover the simultaneous formation of an iodide-rich 2D layer along with a Br halide gradient achieved through partial halide exchange that extends from defective surfaces and grain boundaries into the bulk layer. We demonstrate and directly visualize the tunability of both the 2D layer thickness, halide gradient, and band structure using a unique combination of depth-sensitive nanoscale characterization techniques. We show that the optimization of this interface can extend the charge carrier lifetime to values > 30 <i>μ</i>s, which is the longest value reported for a direct bandgap semiconductor (GaAs, InP, CdTe) over the past 50 years. Furthermore, we show that this heterostructure is well suited for a host of optoelectronic devices where we achieve a new benchmark for perovskite/charge transport layer surface recombination velocity with values < 7 cm s<sup>-1</sup>. Importantly, this work reveals an entirely new strategy and knob for optimizing and tuning recombination and charge transport at semiconductor interfaces and will likely establish new frontiers in achieving the next set of perovskite device performance records.