Apr 23, 2024
2:30pm - 2:45pm
Room 343, Level 3, Summit
Anna Park1,Vivek Anil1,Matthew Barone1,Brendan Faeth1,Tobias Schwaigert1,Kyle Shen1,Darrell Schlom1
Cornell University1
<u>Molecular-beam epitaxy of SrMoO<sub>3</sub> films with record low electrical resistivity</u><br/><u>Anna S. Park<sup>1,2,*</sup></u>, Vivek Anil<sup>3,*</sup>, Matthew R. Barone<sup>1,2</sup>, Brendan D. Faeth<sup>2</sup>, Tobias Schwaigert<sup>1,2</sup>, Kyle M. Shen<sup>3,4 </sup>, Darrell G. Schlom<sup>1,2,4,5</sup><br/><br/><i><sup>1</sup></i><i>Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA</i><br/><i><sup>2</sup></i><i>Platform for the Accelerated Realization, Analysis, and Discovery of Interface Materials (PARADIM), Cornell University, Ithaca, New York 14853</i><br/><i><sup>3</sup></i><i>Department of Physics, Laboratory of Atomic and Solid State Physics, Cornell University, Ithaca, New York 14853, USA</i><br/><i><sup>4</sup></i><i>Kavli Institute at Cornell for Nanoscale Science, Ithaca, New York 14853, USA</i><br/><i><sup>5</sup></i><i>Leibniz-Institut für Kristallzüchtung, Max-Born-Str. </i><i>2, 12489 Berlin, Germany</i><br/>*authors contributed equally<br/><br/>SrMoO<sub>3</sub> is the most conducting perovskite oxide (~5.1 at room temperature),<sup>[1]</sup> about 40 times more conductive than SrRuO<sub>3</sub>. This makes it an attractive material as a bottom electrode for perovskite heterostructures, particularly for the high-<i>K</i> dielectric Ba<i><sub>x</sub></i>Sr<sub>1-<i>x</i></sub>TiO<sub>3.</sub><sup>[2]</sup> Unfortunately, the synthesis of molybdates by traditional MBE is difficult due to the low vapor pressure of molybdenum.<sup>[3]</sup> In contrast to elemental molybdenum, its oxide MoO<sub>3</sub> has a very high vapor pressure, which makes it a suitable candidate for a variant of MBE where a molecular beam of a metal oxide rather than its elemental counterpart is used.<sup>[4]</sup> One challenge of using MoO<sub>3</sub> as a source, however, is its tendency to reduce to non-volatile MoO<sub>2</sub> in an ultrahigh vacuum environment. This challenge was recently circumvented by injecting a steady flow of oxygen directly into the crucible, enabling the growth of SrMoO<sub>3</sub> films using the stable flux of MoO<sub>3</sub> molecules emanating from a MoO<sub>3</sub> source in conjunction with the flux of strontium atoms emanating from a strontium source, both of which were containing within MBE effusion cells.<sup>[3]</sup> The properties of oxide conductors often depend strongly on composition, where off stoichiometry can increase the room-temperature resistivity and dramatically decrease the residual resistivity ratio . This disorder is presumably responsible for the lowest room-temperature resistivity values obtained to date for SrMoO<sub>3</sub> films grown by conventional MBE and pulsed-laser deposition being 24 and , respectively,<sup>[</sup><sup>2,5]</sup> which is a factor of 5 higher than the best SrMnO<sub>3</sub> single crystals.<sup>[1]</sup> Here we report the growth of SrMoO<sub>3</sub> in an adsorption-controlled regime where thermodynamics automatically controls film composition. To achieve this adsorption-controlled regime, substrate temperatures above 1100 °C are needed, which are unattainable in conventional oxide MBE systems. At the PARADIM thin film facility, we can reach substrate temperatures up to 2000 °C with a CO<sub>2</sub>-laser substrate heater, allowing us to capitalize on the volatility of SrO at ~1100 °C. The resulting phase-pure epitaxial SrMoO<sub>3</sub> thin films are characterized by narrow rocking curves, room-temperature resistivities under and residual resistivity ratios higher than the best SrMoO<sub>3</sub> single crystal.<sup>[1]</sup> We additionally map the band structure of these high-quality SrMoO<sub>3</sub> films with angle-resolved photoemission spectroscopy.<br/><br/>[1] I. Nagai, <i>et al</i>. <i>Appl. Phys. Lett.</i> <b>87</b>, 024105 (2005).<br/>[2] H. Takatsu, <i>et al</i>., <i>J. Cryst. Growth</i> <b>543</b>, 125685 (2020).<br/>[3] P. Saig, <i>et al</i>., <i>APL Mater.</i> <b>7</b>, 051107 (2019).<br/>[4] K. Atkinson, <i>et al</i>., <i>APL Mater.</i> <b>8</b>, 081110 (2020).<br/>[5] T. Kuznetsova, <i>et al</i>., <i>J. Vac. Sci. Technol. A</i> <b>41</b> (2023).<br/>[6] A. Radetinac, <i>et al</i>., <i>Appl. Phys. Lett.</i> <b>105</b>, 114108 (2014)