Dec 3, 2024
8:00pm - 10:00pm
Hynes, Level 1, Hall A
Alessia Danagoulian1,Grace Pettis1,2,Jocelyn Zhang1,3,Neil Baker1,Eda Güney4,Jalal Karimzadehkhoei4,Weijing Chen1,Jiaqi Tang1,Henry Chuang1,Benli Jiang1,Anubhav Wadehra1,Karl Ludwig1,Gozde Ince4
Boston University1,Oregon State University2,Massachusetts Institute of Technology3,Sabanci University4
Alessia Danagoulian1,Grace Pettis1,2,Jocelyn Zhang1,3,Neil Baker1,Eda Güney4,Jalal Karimzadehkhoei4,Weijing Chen1,Jiaqi Tang1,Henry Chuang1,Benli Jiang1,Anubhav Wadehra1,Karl Ludwig1,Gozde Ince4
Boston University1,Oregon State University2,Massachusetts Institute of Technology3,Sabanci University4
This study examines wrinkling behavior of Poly(4-Vinylpyridine) (4-VP), (Hydroxyethyl)methacrylate (HEMA), and 2,4,6,8-tetramethyl-2,4,6,8-tetravinylcyclotetrasiloxane (V4D4) polymer thin films bombarded with Ar+ ions. When held in a humid environment post bombardment, HEMA developed nanopatterning within a few hours, reaching hundreds of nanometers in height. Other samples exhibited nanopatterning as well, with V4D4 also developing holes on the surface. When held in a dry chamber instead, 4-VP and HEMA showed no signs of nanopatterning at all, while V4D4 showed slight wrinkles on its surface. To measure chemical structural changes in-situ, some of the experiments utilized an ion sputtering gun within an X-ray photoelectron spectroscopy (XPS) system. By studying bombardment results with in-situ XPS, combined with post facto characterization using atomic force microscopy (AFM), one can begin to understand the chemical and physical causes of wrinkle pattern formations.<br/><br/>This work was partly supported by NSF DMR-2117509.