Ellipsometry Applied to Real Time Process Characterization

In situ characterization during thin-film processing is crucial for optimizing film properties and ensuring quality control and process reliability in various applications, like semiconductors or photovoltaics. Initially dedicated to the control of R&D processes, it is now more and more used in Production control. Spectroscopic ellipsometry (SE) emerges as one of the powerful non-destructive optical techniques that provides real-time monitoring and detailed analysis of thin-film growth and properties.<br/>We will explore the advancements and applications of <i>in situ</i> SE in thin-film processing, highlighting its ability to measure film thickness, optical constants, and layer composition with high precision.<br/>The integration of SE in different deposition techniques, such as chemical vapor deposition (CVD), physical vapor deposition (PVD), and atomic layer deposition (ALD), will be examined, showcasing its role in achieving desired film characteristics.<br/>Case studies demonstrating the successful application of <i>in situ</i> SE in monitoring and controlling film uniformity, interface quality, and material transitions will be presented. The discussion will extend to recent technological advancements in SE instrumentation and data analysis methods, which enhance its sensitivity and accuracy. Practical aspects of implementing <i>in situ</i> and <i>in line </i>SE in industrial and research settings, understanding its impact on improving process efficiency and material performance. This presentation aims to underscore the significance of spectroscopic ellipsometry as an indispensable tool in the evolving landscape of thin-film processing technology.<br/>Understanding the evolution of thin film properties during post-deposition treatments is also vital for optimizing their performance in various applications, including electronics, optics, and coatings. In situ characterization of thin films during these critical post-deposition processes using advanced optical metrology techniques will be presented with their application in optimization of the process, and how monitor and control changes in thin film properties during annealing, curing, and other thermal or chemical treatments can be done.