April 10 - 14, 2023
San Francisco, California
2023 MRS Spring Meeting & Exhibit
EL09.10.20
Effect of O2 Plasma Treatment on the Thickness Uniformity of Chemical Vapor Deposited MoS2 Thin Films on SiO2 Substrates
When and Where
Apr 13, 2023
5:00pm - 7:00pm
5:00pm - 7:00pm
Moscone West, Level 1, Exhibit Hall
Presenter(s)
Co-Author(s)
Irang Lim1,Woong Choi1
School of Materials Science & Engineering, Kookmin University1
Keywords
2D materials | chemical vapor deposition (CVD) (deposition)
Symposium Organizers
Sonia Conesa Boj, Technische Universiteit Delft
Thomas Kempa, Johns Hopkins University
Sudha Mokkapati, Monash University
Esther Alarcon-Llado, AMOLF
Session Chairs
Sonia Conesa-Boj