April 10 - 14, 2023
San Francisco, California
2023 MRS Spring Meeting
EL09.10.20

Effect of O2 Plasma Treatment on the Thickness Uniformity of Chemical Vapor Deposited MoS2 Thin Films on SiO2 Substrates

When and Where

Apr 13, 2023
5:00pm - 7:00pm
Moscone West, Level 1, Exhibit Hall

Presenter(s)

Co-Author(s)

Irang Lim1,Woong Choi1

School of Materials Science & Engineering, Kookmin University1

Keywords

2D materials | chemical vapor deposition (CVD) (deposition)

Symposium Organizers

Sonia Conesa Boj, Technische Universiteit Delft
Thomas Kempa, Johns Hopkins University
Sudha Mokkapati, Monash University
Esther Alarcon-Llado, AMOLF

Session Chairs

Sonia Conesa-Boj

In this Session