Use of PMMA as a Deep UV Photoresist to Produce Patterned Substrates for Surface-Aligned DNA Deposition with Potential Application to Sequencing

When and Where

Nov 27, 2023
8:00pm - 10:00pm

Hynes, Level 1, Hall A

Presenter(s)

Heba Ouerfelli

Boheng Cao

Ellen Hu

Aditi Kiran

Selina Zhang

Alex Zheng

Jonathan Sokolov

Co-Author(s)

Heba Ouerfelli^1,2,Boheng Cao^3,2,Ellen Hu^4,2,Aditi Kiran^5,2,Selina Zhang^6,2,Alex Zheng^7,2,Jonathan Sokolov²

Fort Lee High School¹,Stony Brook University²,North Hollywood High School³,C. Leon King High School⁴,BASIS Independent Fremont⁵,North Hunterdon High School⁶,Stuyvesant High School⁷

Keywords

DNA | molecular weight | polymer

Symposium Organizers

Herdeline Ann Ardoña, University of California, Irvine

Guglielmo Lanzani, Italian Inst of Technology

Eleni Stavrinidou, Linköping University

Flavia Vitale, University of Pennsylvania

Symposium Support

Bronze
iScience | Cell Press

Session Chairs

Herdeline Ann Ardoña

Guglielmo Lanzani

Symposium Supporters

2023 MRS Fall Meeting & Exhibit