Replacing Hydrogen Sulfide with Di-tert-butyl Disulfide as an Atomic Layer Deposition Precursor for Synthesizing Transition Metal Dichalcogenides

Nov 27, 2023
4:45pm - 5:00pm

Hynes, Level 3, Ballroom B

Ian Campbell

Ageeth Bol

Ian Campbell¹,Douglas Heine¹,Ageeth Bol¹

University of Michigan–Ann Arbor¹

2D materials | atomic layer deposition | thin film

Gabriela Borin Barin, Empa

Shengxi Huang, Rice University

Yuxuan Cosmi Lin, TSMC Technology Inc

Lain-Jong Li, The University of Hong Kong

Silver
Montana Instruments

Bronze
Oxford Instruments WITec
PicoQuant
Raith America, Inc.

Gabriela Borin Barin

Ernesto Joselevich