Growth and Characterization of N-Doped VO2 Thin Films for the Thermochromic and Smart Windows by the Mist Chemical Vapor Deposition

Nov 28, 2023
8:00pm - 10:00pm

Hynes, Level 1, Hall A

Taisei Kano

Yuta Arata

Hiroyuki Nishinaka

Masahiro Yoshimoto

Taisei Kano¹,Yuta Arata¹,Hiroyuki Nishinaka¹,Masahiro Yoshimoto¹

Kyoto Institute of Technology¹

chemical vapor deposition (CVD) (deposition) | thin film

Craig Brown, National Institute of Standards and Technology

Michelle Dolgos, University of Calgary

Rie Makiura, Osaka Metropolitan University

Brent Melot, University of Southern California

Bronze
Anton Paar
Hiden Analytical Inc

Craig Brown

Brent Melot