Vertical α-Ga2O3 Device Applications Enabled by Same Crystal Structured Indium Tin Oxide Electrode via Mist Chemical Vapor Deposition

Nov 30, 2023
9:15am - 9:30am

Hynes, Level 2, Room 210

Kazuki Shimazoe

Hiroyuki Nishinaka

Temma Ogawa

Masahiro Yoshimoto

Kazuki Shimazoe¹,Hiroyuki Nishinaka¹,Temma Ogawa¹,Masahiro Yoshimoto¹

Kyoto Institute of Technology¹

chemical vapor deposition (CVD) (deposition) | oxide

Stephen Goodnick, Arizona State University

Robert Kaplar, Sandia National Laboratories

Martin Kuball, University of Bristol

Yoshinao Kumagai, Tokyo University of Agriculture and Technology

Silver
Taiyo Nippon Sanson

Stephen Goodnick

Robert Kaplar