May 8 - 13, 2022
Honolulu, Hawaii
May 23 - 25, 2022 (Virtual)
2022 MRS Spring Meeting
EQ03.04.18
Synthesis of a Si-Containing Gradient Block Copolymer and Its Application to EUV Lithography by Aspect Ratio Enhancement
When and Where
May 9, 2022
5:00pm - 7:00pm
5:00pm - 7:00pm
Hawai'i Convention Center, Level 1, Kamehameha Exhibit Hall 2 & 3
Presenter(s)
Co-Author(s)
Yemin Park1,Seung Won Song1,Yeon Sik Jung1
Korea Advanced Institute of Science and Technology1
Keywords
polymerization | self-assembly | surface chemistry
Symposium Organizers
Natalie Stingelin, Georgia Institute of Technology
Oana Jurchescu, Wake Forest University
Emanuele Orgiu, Université du Québec/Institut National de la Recherche Scientifique
Yutaka Wakayama, NIMS
Symposium Support
Bronze
MilliporeSigma
The Japan Society of Applied Physics
MilliporeSigma
The Japan Society of Applied Physics
Session Chairs
Maryam Alsufyani