Integrating ALD with Anion Exchange Chemistry to Tune p-type CuO_xS_y Semiconductors with Atomic Precision

May 8, 2022
10:30am - 10:45am

Hawai'i Convention Center, Level 3, 314

Julia Lenef

Jaesung Jo

Andrew Gayle

Julia Lenef¹,Jaesung Jo¹,Andrew Gayle¹,Orlando Trejo¹,Rebecca Peterson¹,Neil Dasgupta¹

University of Michigan–Ann Arbor¹

atomic layer deposition | surface reaction | thin film

Santanu Bag, Air Force Research Laboratory

Silvia Armini, IMEC

Mandakini Kanungo, Corning Incorporated

Hong Zhao, Virginia Commonwealth University

Silver
Corning Inc

Bronze
NovaCentrix

Silvia Armini

Santanu Bag

Integrating ALD with Anion Exchange Chemistry to Tune p-type CuOxSy Semiconductors with Atomic Precision