Investigation of the Hetero-Epitaxial Growth Behavior of the Ultrathin Dielectric Films with HfO₂/Al-Doped TiO₂ Bilayer Structure

Nov 28, 2022
10:30am - 10:45am

Sheraton, 2nd Floor, Back Bay D

Kun Hee Ye

In Soo Lee

Junil Lim

Haengha Seo

Tae Kyun Kim

Heewon Paik

Dae Seon Kwon¹,Kun Hee Ye^1,2,In Soo Lee¹,Junil Lim¹,Haengha Seo¹,Tae Kyun Kim¹,Heewon Paik¹,Jonghoon Shin¹,Jung-Hae Choi²,Cheol Seong Hwang¹

Seoul National University¹,Korea Institute of Science and Technology²

atomic layer deposition | surface chemistry

Ying-Hao Chu, National Tsing Hua University

Catherine Dubourdieu, Helmholtz-Zentrum Berlin / Freie Universität Berlin

Olga Ovchinnikova, Oak Ridge National Laboratory

Bhagwati Prasad, Indian Institute of Science

Bronze
CRYOGENIC LIMITED

Catherine Dubourdieu

Olga Ovchinnikova

Investigation of the Hetero-Epitaxial Growth Behavior of the Ultrathin Dielectric Films with HfO2/Al-Doped TiO2 Bilayer Structure