Science and Technology of Integrated Super-High Dielectric Constant AlO_x/TiO_y Nanolaminates / Diamond for MOS Capacitors and MOSFETs

Apr 20, 2021
2:55pm - 3:10pm

EL04

Jiangwei Liu

Bo Da

Yasuo Koide

Orlando Auciello^1,2,Jiangwei Liu³,Elida de Obaldia^4,1,Bo Da³,Yasuo Koide³

The University of Texas at Dallas¹,Original Biomedical Implants, LLC²,National Institute for Materials Science³,Universidad Tecnológica de Panamá⁴

atomic layer deposition | diamond

Hongping Zhao, The Ohio State University

Masataka Higashiwaki, National Institute of Information & Comm Tech

Robert Kaplar, Sandia National Laboratories

Julien Pernot, University of Grenoble

Silver
Taiyo Nippon Sanso

Jocelyn Achard

Nicolas Rouger

Science and Technology of Integrated Super-High Dielectric Constant AlOx/TiOy Nanolaminates / Diamond for MOS Capacitors and MOSFETs