April 17 - 23, 2021
April 17 - 23, 2021 (Virtual)
2021 MRS Spring Meeting
EL08.03.04

Amorphous Si-Rich W Silicide as a New Barrier and Contact Material for Advanced CMOS

When and Where

Apr 23, 2021
9:10pm - 9:35pm
EL08

Presenter(s)

Co-Author(s)

Naoya Okada1,Noriyuki Uchida1,Shinichi Ogawa1,Toshihiko Kanayama1

National Institute of Advanced Industrial Science and Technology1

Keywords

chemical vapor deposition (CVD) (chemical reaction)

Symposium Organizers

Silvia Armini, IMEC
Vincent Jousseaume, CEA-LETI
Eiichi Kondoh, University of Yamanashi
Andrew Simon, IBM T.J. Watson Research Center

Symposium Support

Bronze
MilliporeSigma

Session Chairs

Eiichi Kondoh
Andrew Simon

In this Session