November 29 - December 2, 2021
Boston, Massachusetts
December 6 - 8, 2021 (Virtual)
2021 MRS Fall Meeting
SF01.12.01
Understanding and Tuning Surface Chemistry to Achieve Area Selective ALD
When and Where
Dec 8, 2021
10:30am - 11:00am
10:30am - 11:00am
SF01-Virtual
Presenter(s)
Co-Author(s)
Stacey Bent1
Stanford University1
Keywords
atomic layer deposition | selective area deposition | surface chemistry
Symposium Organizers
Noa Lachman, Tel Aviv University
Graziella Malandrino, Univ di Catania
Kevin Musselman, University of Waterloo
Wyatt Tenhaeff, University of Rochester
Symposium Support
Bronze
Waterloo Institute for Nanotechnology
Waterloo Institute for Nanotechnology
Session Chairs
Robert Hoye
Graziella Malandrino