Highly Improved Ferroelectricity and Reliability in Hf_0.5Zr_0.5O₂ Films Using a HfO_xN_y Interfacial Layer

When and Where

Nov 30, 2021
11:15am - 11:30am

Hynes, Level 3, Room 302

Presenter(s)

Beom Yong Kim

Hyeon Woo Park

Yong Bin Lee

Suk Hyun Lee

Minsik Oh

Seung Kyu Ryoo

In Soo Lee

Doosup Shim

Min Hyuk Park

Cheol Seong Hwang

Co-Author(s)

Beom Yong Kim¹,Hyeon Woo Park¹,Yong Bin Lee¹,Suk Hyun Lee¹,Minsik Oh¹,Seung Kyu Ryoo¹,In Soo Lee¹,Doosup Shim¹,Min Hyuk Park^2,1,Cheol Seong Hwang¹

Seoul National University¹,Pusan National University²

Keywords

interface

Symposium Organizers

Brent Melot, University of Southern California

Craig Brown, National Institute of Standards and Technology

Amparo Fuertes, ICMAB-CSIC

Hiroshi Kageyama, Kyoto University

Symposium Support

Bronze
Chemistry of Materials | ACS Publications
Hiden Analytical, Inc
Inorganic Chemistry | ACS Publications
Journal of Solid State Chemistry | Elsevier
Quantum Design, Inc.

Session Chairs

Brent Melot

Katharine Page

2021 MRS Fall Meeting

Highly Improved Ferroelectricity and Reliability in Hf0.5Zr0.5O2 Films Using a HfOxNy Interfacial Layer