Rapid, Low-Temperature Growth of p-type Oxides by Atmospheric Pressure Chemical Vapor Deposition for Photovoltaics and Field-Effect Transistors

When and Where

Dec 7, 2021
1:00pm - 1:30pm

SF01-Virtual

Presenter(s)

Rob Jagt

Tahmida Huq

Mari Napari

Maung Thway

Tianyuan Liu

David Meeth

Kham Niang

Andrew Flewitt

Fen Lin

Judith MacManus-Driscoll

Robert Hoye

Co-Author(s)

Robert Hoye⁴,Rob Jagt¹,Tahmida Huq¹,Mari Napari²,Maung Thway³,Tianyuan Liu³,David Meeth¹,Kham Niang¹,Andrew Flewitt¹,Fen Lin³,Judith MacManus-Driscoll¹

University of Cambridge¹,University of Southampton²,National University of Singapore³,Imperial College London⁴

Keywords

chemical vapor deposition (CVD) (chemical reaction) | oxide

Symposium Organizers

Noa Lachman, Tel Aviv University

Graziella Malandrino, Univ di Catania

Kevin Musselman, University of Waterloo

Wyatt Tenhaeff, University of Rochester

Symposium Support

Bronze
Waterloo Institute for Nanotechnology

Session Chairs

Noa Lachman

Kevin Musselman

2021 MRS Fall Meeting