Clemens Heske1,2,Lothar Weinhardt1,2,Dirk Hauschild1,Monika Blum3,2
Karlsruhe Institute of Technology (KIT)1,University of Nevada, Las Vegas2,Lawrence Berkeley National Laboratory3
Keywords
in situ
| surface chemistry
Symposium Organizers
Chengjun Sun, Argonne National Laboratory
Jenny Lockard, Rutgers, The State University of New Jersey
Feng Wang, Brookhaven National Laboratory
Markus Winterer, University of Duisburg-Essen
Symposium Support
Rutgers University - Newark Chancellor's Office Rutgers University - Newark Department of Chemistry The Advanced Photon Source (APS) at Argonne National Laboratory