April 22 - 26, 2019
Phoenix, Arizona
2019 MRS Spring Meeting
EP09.09.04
Area Selective Atomic Layer Deposition of MoSiOx on Si (001) in Preference to SiO2
When and Where
Apr 25, 2019
2:30pm - 2:45pm
2:30pm - 2:45pm
PCC North, 200 Level, Room 224 B
Presenter(s)
Co-Author(s)
Jong Youn Choi1,Christopher Ahles1,Keith Wong2,Srinivas Nemani2,Ellie Yieh2,Andrew Kummel1
University of California, San Diego1,Applied Materials, Inc.2
Keywords
atomic layer deposition | surface reaction
Symposium Organizers
Rinus Lee, GlobalFoundries
Kah-Wee Ang, National University of Singapore
Catherine Dubourdieu, Helmholtz-Zentrum Berlin / Freie Universität Berlin
John Robertson, Cambridge University
Symposium Support
Applied Materials, Inc.
Session Chairs
Rinus Lee
John Robertson
Shinichi Takagi