April 22 - 26, 2019
Phoenix, Arizona
2019 MRS Spring Meeting
EP09.09.03

Improvement of Interfacial Layer of HfO2-Based Gate Stacks on Ge by Incorporating Titanium into GeOx

When and Where

Apr 25, 2019
2:15pm - 2:30pm
PCC North, 200 Level, Room 224 B

Presenter(s)

Co-Author(s)

Chih Hsuan Huang1,Wei Yan1

Peking University1

Keywords

Ge | interface | Ti

Symposium Organizers

Rinus Lee, GlobalFoundries
Kah-Wee Ang, National University of Singapore
Catherine Dubourdieu, Helmholtz-Zentrum Berlin / Freie Universität Berlin
John Robertson, Cambridge University

Symposium Support

Applied Materials, Inc.

Session Chairs

Rinus Lee
John Robertson
Shinichi Takagi

In this Session