April 22 - 26, 2019
Phoenix, Arizona
2019 MRS Spring Meeting
EP09.06.03
Effect of Dose Rate on Interstitial-Vacancy Recombination in Silicon During Helium Implantation
When and Where
Apr 24, 2019
2:15pm - 2:30pm
2:15pm - 2:30pm
PCC North, 200 Level, Room 224 B
Presenter(s)
Co-Author(s)
Katherine Haynes1,Xunxiang Hu2,Brian Wirth2,3,Christopher Hatem4,Kevin Jones1
University of Florida1,Oak Ridge National Laboratory2,The University of Tennessee, Knoxville3,Applied Materials, Inc.4
Keywords
defects | He | transmission electron microscopy (TEM)
Symposium Organizers
Rinus Lee, GlobalFoundries
Kah-Wee Ang, National University of Singapore
Catherine Dubourdieu, Helmholtz-Zentrum Berlin / Freie Universität Berlin
John Robertson, Cambridge University
Symposium Support
Applied Materials, Inc.
Session Chairs
Won Jong Yoo