December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
MT05.02.09
Transfer of Sub-10 nm Patterns to Substrate Using Helium Ion Beam Lithography and Reactive-Ion Etch
When and Where
Dec 2, 2019
4:45pm - 5:00pm
4:45pm - 5:00pm
Hynes, Level 2, Room 204
Presenter(s)
Co-Author(s)
Matthew Hunt1,S. Lewis1,2,N. Lee1,H. Alty2,J. Yang1,3,A. Wertheim1,G. DeRose1,Stephen Yeates2,Richard Winpenny2,A. Scherer1
California Institute of Technology1,The University of Manchester2,Stanford University3
Keywords
ion beam analysis
Symposium Organizers
Frances Allen, University of California, Berkeley
Alex Belianinov, Oak Ridge National Laboratory
Silke Christiansen, Helmholtz Zentrum Berlin für Materialien und Energie
Shane Cybart, University of California, Riverside
Symposium Support
Gold
Raith America, Inc.
Silver
ZEISS
Bronze
Kleindiek Nanotechnik GmbH
ORSAY PHYSICS
Ted Pella, Inc.
Raith America, Inc.
Silver
ZEISS
Bronze
Kleindiek Nanotechnik GmbH
ORSAY PHYSICS
Ted Pella, Inc.
Session Chairs
Frances Allen
Alex Belianinov
Shane Cybart