December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF05.01.02

Multi-Scale Modelling and Experimental Analysis of ALD Alumina—Interplay of Process Dynamics, Chemistry and Interfacial Phenomena

When and Where

Dec 2, 2019
8:45am - 9:00am
Hynes, Level 3, Room 310

Presenter(s)

Co-Author(s)

Constantin Vahlas4,Giorgos Gakis1,Emmanuel Scheid2,Hugues Vergnes3,Andreas Boudouvis1,Brigitte Caussat3

National Technical University of Athens1,LAAS2,Institut National Polytechnique de Toulouse3,CNRS4

Keywords

atomic layer deposition | thin film

Symposium Organizers

Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS

Symposium Support

Gold
GVD Corporation
Lam Research Corp

Silver
Specialty Coating Systems

Bronze
Waterloo Institute for Nanotechnology

Session Chairs

David Bergsman
Graziella Malandrino

In this Session