December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF05.06.28
Thickness Gradient Film Formation by Spatial Atomic Layer Deposition for High-Throughput Screening of MIM Diodes
When and Where
Dec 3, 2019
8:00pm - 10:00pm
8:00pm - 10:00pm
Hynes, Level 1, Hall B
Presenter(s)
Co-Author(s)
Abdullah Alshehri1,2,Khaled Ibrahim1,Kissan Mistry1,Jhi Loke1,Mustafa Yavuz1,Kevin Musselman1
University of Waterloo1,Prince Sattam Bin Abdulaziz University2
Keywords
atomic layer deposition | chemical vapor deposition (CVD) (chemical reaction) | combinatorial synthesis
Symposium Organizers
Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS
Symposium Support
Gold
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
Session Chairs
Graziella Malandrino
David Munoz-Rojas