December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF05.02.01
Atomic Layer Deposition of Zinc-Doped Alumina at Room-Temperature for Organic Opto-Electronics
When and Where
Dec 2, 2019
1:30pm - 1:45pm
1:30pm - 1:45pm
Hynes, Level 3, Room 310
Presenter(s)
Co-Author(s)
Shiv Bhudia1,Sabrina Wack1,Noureddine Adjeroud1,Jérôme Guillot1,Renaud Leturcq1
Luxembourg Institute of Science and Technology1
Keywords
atomic layer deposition | thin film
Symposium Organizers
Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS
Symposium Support
Gold
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
Session Chairs
Sean Barry
Ralf Tonner