December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF01.16.03
Edge Terminations Control of Tungsten Diselenide Domains Using Chemical Vapor Deposition
When and Where
Dec 4, 2019
8:00pm - 10:00pm
8:00pm - 10:00pm
Hynes, Level 1, Hall B
Presenter(s)
Co-Author(s)
Yoobeen Lee1,Jin Seok Lee1
Sookmyung Women's University1
Keywords
chemical vapor deposition (CVD) (deposition) | Raman spectroscopy | scanning tunneling microscopy (STM)
Symposium Organizers
Zakaria Al Balushi, University of California, Berkeley
Deep Jariwala, University of Pennsylvania
Olga Kazakova, National Physical Laboratory
Amber McCreary, National Institute of Standards and Technology
Symposium Support
Gold
AIXTRON SE
Silver
2D Crystal Consortium - Materials Innovation Platform (2DCC-MIP)
Bronze
Accurion Inc.
IOP Publishing Ltd - 2D Materials
Scienta Omicron, Inc.
AIXTRON SE
Silver
2D Crystal Consortium - Materials Innovation Platform (2DCC-MIP)
Bronze
Accurion Inc.
IOP Publishing Ltd - 2D Materials
Scienta Omicron, Inc.
Session Chairs
Zakaria Al Balushi
Deep Jariwala
Olga Kazakova
Amber McCreary