Reactivity of Atomic Layer Deposition Precursors with OH/H₂O-Containing Metal Organic Framework Materials

Dec 2, 2019
11:15am - 11:30am

Hynes, Level 3, Room 310

Kui Tan

Liang Feng

Jing Li

Hongcai Zhou

Yves Chabal

Kui Tan¹,Stephanie Jensen²,Liang Feng³,Jing Li⁴,Hongcai Zhou³,Timo Thonhauser²,Yves Chabal¹

The University of Texas at Dallas¹,Wake Forest University²,Texas A&M University³,Rutgers, The State University of New Jersey⁴

atomic layer deposition | in situ | spectroscopy

Kevin Musselman, University of Waterloo

Stacey Bent, Stanford University

Karen Gleason, Massachusetts Institute of Technology

David Munoz-Rojas, LMGP Grenoble INP/CNRS

Gold
GVD Corporation
Lam Research Corp

Silver
Specialty Coating Systems

Bronze
Waterloo Institute for Nanotechnology

David Bergsman

Graziella Malandrino

Reactivity of Atomic Layer Deposition Precursors with OH/H2O-Containing Metal Organic Framework Materials