December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF05.06.12
Understanding the Initial Growth During Atomic Layer Deposition of Nickel Sulfide via In Situ X-Ray Photoelectron Spectroscopy and Low Energy Ion Scattering
When and Where
Dec 3, 2019
8:00pm - 10:00pm
8:00pm - 10:00pm
Hynes, Level 1, Hall B
Presenter(s)
Co-Author(s)
Yuanhong Gao1,Ran Zhao1,Xinwei Wang1
Peking University1
Keywords
atomic layer deposition | surface chemistry | x-ray photoelectron spectroscopy (XPS)
Symposium Organizers
Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS
Symposium Support
Gold
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
Session Chairs
Graziella Malandrino
David Munoz-Rojas