December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
MT03.10.11
Alkyltin Keggin Clusters as Photoresist Material for Extreme Ultraviolet Lithography
When and Where
Dec 4, 2019
8:00pm - 10:00pm
8:00pm - 10:00pm
Hynes, Level 1, Hall B
Presenter(s)
Co-Author(s)
Rebecca Stern1,Danielle Hutchison2,Morgan Olsen2,Lev Zakharov2,Kristin Persson1,3,May Nyman2
University of California, Berkeley1,Oregon State University2,Lawrence Berkeley National Laboratory3
Keywords
organometallic | Sn
Symposium Organizers
Kedar Hippalgaonkar, Institute of Materials Research and Engineering
Tonio Buonassisi, Massachusetts Institute of Technology
Kristin Persson, Lawrence Berkeley National Laboratory
Edward Sargent, University of Toronto
Symposium Support
Bronze
Matter & Patterns | Cell Press
Matter & Patterns | Cell Press
Session Chairs
Tonio Buonassisi
Kedar Hippalgaonkar
Kristin Persson
Edward Sargent