December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
EL05.05.01
Recent Progress in Inversion Channel Diamond MOSFET
When and Where
Dec 3, 2019
8:30am - 9:00am
8:30am - 9:00am
Hynes, Level 1, Room 107
Presenter(s)
Co-Author(s)
Norio Tokuda1,2,Tsubasa Matsumoto1,Takao Inokuma1,Satoshi Yamasaki2,1,Hiromitsu Kato2,Toshiharu Makino2,Christoph Nebel3,1
Kanazawa Univ1,National Institute of Advanced Industrial Science and Technology2,Fraunhofer Institute for Applied Solid State Physics3
Keywords
diamond | interface | plasma-enhanced CVD (PECVD) (deposition)
Symposium Organizers
Mariko Suzuki, Cornes Technologies Ltd
Thomas Schuelke, Fraunhofer USA
Emmanuel Scorsone, CEA
Satoshi Yamasaki, National Institute of Advanced Industrial Science and Technology
Symposium Support
Silver
Seki Diamond Systems, Cornes Technologies
Bronze
Applied Diamond Inc.
DiamFab
ESIEE Paris - CCIR Paris Ile-de-France
Fraunhofer USA - Center for Coatings and Diamond Technologies
PhDTalent
Plasmability LLC
Seki Diamond Systems, Cornes Technologies
Bronze
Applied Diamond Inc.
DiamFab
ESIEE Paris - CCIR Paris Ile-de-France
Fraunhofer USA - Center for Coatings and Diamond Technologies
PhDTalent
Plasmability LLC
Session Chairs
Julien Pernot