December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF05.06.06
Fabrication of Ferroelectric Hf0.5Zr0.5O2 Thin Film by Atomic Layer Deposition (ALD) Using H2O2 Precursor
When and Where
Dec 3, 2019
8:00pm - 10:00pm
8:00pm - 10:00pm
Hynes, Level 1, Hall B
Presenter(s)
Co-Author(s)
Hyoungkyu Kim1,Seokjung Yun1,Hoon Kim1,Changdeuck Bae2,Seungbum Hong1
Korea Advanced Institute of Science and Technology1,Sungkyunkwan University2
Keywords
atomic layer deposition
Symposium Organizers
Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS
Symposium Support
Gold
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
Session Chairs
Graziella Malandrino
David Munoz-Rojas