December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF05.06.05
Gaining Insight into Self-Limiting Surface Reactions During Plasma-Assisted Atomic Layer Deposition of III-Nitrides via In Situ Ellipsometry
When and Where
Dec 3, 2019
8:00pm - 10:00pm
8:00pm - 10:00pm
Hynes, Level 1, Hall B
Presenter(s)
Co-Author(s)
Saidjafarzoda Ilhom1,Deepa Shukla1,Adnan Mohammad1,Ali Okyay2,Blaine Johs3,Brian Willis1,Necmi Biyikli1
University of Connecticut1,Stanford University2,Film Sense LLC3
Keywords
atomic layer deposition | nitride | plasma deposition
Symposium Organizers
Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS
Symposium Support
Gold
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
Session Chairs
Graziella Malandrino
David Munoz-Rojas