Growth and Characterization of Corundum Structure Oxide Semiconductor on α-Fe₂O₃ Buffer Layers by The Mist CVD Method

Dec 3, 2019
8:00pm - 10:00pm

Hynes, Level 1, Hall B

Kazuki Shimazoe

Hiroyuki Nishinaka

Daisuke Tahara

Yuta Arata

Masahiro Yoshimoto

Kazuki Shimazoe¹,Hiroyuki Nishinaka¹,Daisuke Tahara¹,Yuta Arata¹,Masahiro Yoshimoto¹

Kyoto Institute of Technology¹

chemical vapor deposition (CVD) (deposition) | Ga | In

Kevin Musselman, University of Waterloo

Stacey Bent, Stanford University

Karen Gleason, Massachusetts Institute of Technology

David Munoz-Rojas, LMGP Grenoble INP/CNRS

Gold
GVD Corporation
Lam Research Corp

Silver
Specialty Coating Systems

Bronze
Waterloo Institute for Nanotechnology

Graziella Malandrino

David Munoz-Rojas

Growth and Characterization of Corundum Structure Oxide Semiconductor on α-Fe2O3 Buffer Layers by The Mist CVD Method