Growth and Characterization of Orthorhombic ε-Ga₂O₃ Thin Films Fabricated via Mist Chemical Vapor Deposition Technique

Dec 2, 2019
4:00pm - 4:15pm

Hynes, Level 3, Room 310

Daisuke Tahara

Hiroyuki Nishinaka

Yuta Arata

Kazuki Shimazoe

Yusuke Ito

Minoru Noda

Masahiro Yoshimoto

Daisuke Tahara¹,Hiroyuki Nishinaka¹,Yuta Arata¹,Kazuki Shimazoe¹,Yusuke Ito¹,Minoru Noda¹,Masahiro Yoshimoto¹

Kyoto Institute of Technology¹

oxide | thin film

Kevin Musselman, University of Waterloo

Stacey Bent, Stanford University

Karen Gleason, Massachusetts Institute of Technology

David Munoz-Rojas, LMGP Grenoble INP/CNRS

Gold
GVD Corporation
Lam Research Corp

Silver
Specialty Coating Systems

Bronze
Waterloo Institute for Nanotechnology

Sean Barry

Ralf Tonner

Growth and Characterization of Orthorhombic ε-Ga2O3 Thin Films Fabricated via Mist Chemical Vapor Deposition Technique