April 2 - 6, 2018
Phoenix, Arizona
2018 MRS Spring Meeting
EP01.10.04
A Dry NF3/NH3 Plasma Clean for Removing Si Native Oxide and Leaving a Smooth Si Surface
When and Where
Apr 6, 2018
8:45am - 9:00am
8:45am - 9:00am
PCC North, 200 Level, Room 224 A
Presenter(s)
Co-Author(s)
Christopher Ahles1,Jong Youn Choi1,Andrew Kummel1
University of California, San Diego1
Keywords
reactive ion etching | scanning tunneling microscopy (STM) | x-ray photoelectron spectroscopy (XPS)
Symposium Organizers
John Robertson, Cambridge University
Jesus del Alamo, Massachusetts Institute of Technology
Andrew Kummel, University of California, San Diego
Masaaki Niwa, Tohoku University
Symposium Support
MRS Invitation to Publish
All authors are invited to submit articles based on their 2018 MRS Spring
Meeting presentations to journals in the MRS portfolio.
(www.mrs.org/publications-news) Papers submitted and accepted for
publication in MRS Advances (www.mrs.org/mrs-advances) will be
available as symposium collections. Visit the MRS/Cambridge University
Press Publications Booth #100 in the Exhibit Hall to learn more, including
MRS Advances print options available at special rates during the meeting
week only.
All authors are invited to submit articles based on their 2018 MRS Spring
Meeting presentations to journals in the MRS portfolio.
(www.mrs.org/publications-news) Papers submitted and accepted for
publication in MRS Advances (www.mrs.org/mrs-advances) will be
available as symposium collections. Visit the MRS/Cambridge University
Press Publications Booth #100 in the Exhibit Hall to learn more, including
MRS Advances print options available at special rates during the meeting
week only.
Session Chairs
Andrew Kummel