April 2 - 6, 2018
Phoenix, Arizona
2018 MRS Spring Meeting
NM05.07.04
Quantum Dots as New Generation EUV Photoresist
Quantum Dots as New Generation EUV Photoresist
When and Where
Apr 4, 2018
3:45pm - 4:00pm
3:45pm - 4:00pm
PCC North, 200 Level, Room 229 B
Presenter(s)
Co-Author(s)
Christian Dieleman1,Bruno Ehrler1
AMOLF1
Keywords
lithography (removal) | nanostructure
Symposium Organizers
Hongyou Fan, Sandia National Laboratories
Feng Bai, Henan University
Mei Cai, General Motors Company
Yu Han, King Abdullah University of Science and Technology
Symposium Support
Angstrom Thin Film Technologies LLC
General Motors
Henan University
MilliporeSigma (Sigma-Aldrich Materials Science)
General Motors
Henan University
MilliporeSigma (Sigma-Aldrich Materials Science)
MRS Invitation to Publish
All authors are invited to submit articles based on their 2018 MRS Spring
Meeting presentations to journals in the MRS portfolio.
(www.mrs.org/publications-news) Papers submitted and accepted for
publication in MRS Advances (www.mrs.org/mrs-advances) will be
available as symposium collections. Visit the MRS/Cambridge University
Press Publications Booth #100 in the Exhibit Hall to learn more, including
MRS Advances print options available at special rates during the meeting
week only.
All authors are invited to submit articles based on their 2018 MRS Spring
Meeting presentations to journals in the MRS portfolio.
(www.mrs.org/publications-news) Papers submitted and accepted for
publication in MRS Advances (www.mrs.org/mrs-advances) will be
available as symposium collections. Visit the MRS/Cambridge University
Press Publications Booth #100 in the Exhibit Hall to learn more, including
MRS Advances print options available at special rates during the meeting
week only.
Session Chairs
Hongyou Fan
Yu Han